Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...
Insight into high-level synthesis (HLS). Advantages of using HLS with AI acceleration. All things in your life are getting smarter. From the vehicles that will move you around, to the house you live ...
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